JPH0517703B2 - - Google Patents

Info

Publication number
JPH0517703B2
JPH0517703B2 JP63240283A JP24028388A JPH0517703B2 JP H0517703 B2 JPH0517703 B2 JP H0517703B2 JP 63240283 A JP63240283 A JP 63240283A JP 24028388 A JP24028388 A JP 24028388A JP H0517703 B2 JPH0517703 B2 JP H0517703B2
Authority
JP
Japan
Prior art keywords
layer
type
bipolar transistor
element formation
collector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63240283A
Other languages
English (en)
Japanese (ja)
Other versions
JPH02327A (ja
Inventor
Hiroshi Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Publication of JPH02327A publication Critical patent/JPH02327A/ja
Publication of JPH0517703B2 publication Critical patent/JPH0517703B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions 
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D10/00—Bipolar junction transistors [BJT]
    • H10D10/311—Thin-film BJTs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/74—Making of localized buried regions, e.g. buried collector layers, internal connections substrate contacts
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/23—Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Bipolar Transistors (AREA)
JP63240283A 1987-10-09 1988-09-26 半導体装置 Granted JPH02327A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP62-255686 1987-10-09
JP25568687 1987-10-09

Publications (2)

Publication Number Publication Date
JPH02327A JPH02327A (ja) 1990-01-05
JPH0517703B2 true JPH0517703B2 (en]) 1993-03-09

Family

ID=17282216

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63240283A Granted JPH02327A (ja) 1987-10-09 1988-09-26 半導体装置

Country Status (4)

Country Link
US (1) US5095351A (en])
EP (1) EP0311419A3 (en])
JP (1) JPH02327A (en])
KR (1) KR920003319B1 (en])

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0474564A1 (en) * 1990-09-07 1992-03-11 Fujitsu Limited Lateral bipolar transistor having electrically induced emitter and collector regions
DE59108607D1 (de) * 1990-09-20 1997-04-17 Siemens Ag Bipolartransistor für hohe Leistung im Mikrowellenlängenbereich
US5621239A (en) * 1990-11-05 1997-04-15 Fujitsu Limited SOI device having a buried layer of reduced resistivity
JP2654268B2 (ja) * 1991-05-13 1997-09-17 株式会社東芝 半導体装置の使用方法
DE4306655C2 (de) * 1992-03-04 1997-04-30 Toshiba Kawasaki Kk Verfahren zum Herstellen eines planaren Induktionselements
US5270265A (en) * 1992-09-01 1993-12-14 Harris Corporation Stress relief technique of removing oxide from surface of trench-patterned semiconductor-on-insulator structure
SE515867C2 (sv) * 1995-04-13 2001-10-22 Ericsson Telefon Ab L M Bipolär SOI-transistor
US6043555A (en) * 1995-04-13 2000-03-28 Telefonaktiebolget Lm Ericsson Bipolar silicon-on-insulator transistor with increased breakdown voltage
JP2001085463A (ja) * 1999-09-09 2001-03-30 Rohm Co Ltd 半導体チップおよびそれを用いた半導体装置
US6812533B2 (en) * 2002-12-24 2004-11-02 International Business Machines Corporation SOI based bipolar transistor having a majority carrier accumulation layer as subcollector
WO2004106891A2 (en) 2003-05-22 2004-12-09 University Of Hawaii Ultrasensitive biochemical sensor
US7375410B2 (en) 2004-02-25 2008-05-20 International Business Machines Corporation Ultra-thin SOI vertical bipolar transistors with an inversion collector on thin-buried oxide (BOX) for low substrate-bias operation and methods thereof
US20050205891A1 (en) * 2004-03-18 2005-09-22 Holm-Kennedy James W Distributed channel bipolar devices and architectures
US8420494B1 (en) * 2004-03-18 2013-04-16 University Of Hawaii Distributed channel bipolar devices and architectures
JP2008539578A (ja) * 2005-04-28 2008-11-13 エヌエックスピー ビー ヴィ バイポーラートランジスターの作製方法
US20230028453A1 (en) * 2021-07-23 2023-01-26 Taiwan Semiconductor Manufacturing Company Limited Semiconductor Arrangement and Method of Manufacture

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4910562A (en) * 1982-04-26 1990-03-20 International Business Machines Corporation Field induced base transistor
US4885623A (en) * 1987-10-30 1989-12-05 Holm Kennedy James W Distributed channel-bipolar device

Also Published As

Publication number Publication date
EP0311419A2 (en) 1989-04-12
KR920003319B1 (ko) 1992-04-27
US5095351A (en) 1992-03-10
KR890007433A (ko) 1989-06-19
JPH02327A (ja) 1990-01-05
EP0311419A3 (en) 1990-02-14

Similar Documents

Publication Publication Date Title
JPH0517703B2 (en])
JP2002261297A (ja) 低濃度にドープされたドレインを有するラテラルｍｏｓ電界効果トランジスタ及びその製造方法
JP3641489B2 (ja) 多機能電子部品、とくに負性動抵抗素子、およびその製造方法並びに使用方法
KR20040057911A (ko) 바이폴라 트랜지스터, 전자 회로 및 집적 회로
US6864542B2 (en) Bipolar transistor manufacturing method
JPH0347576B2 (en])
JPH06151728A (ja) 半導体集積回路装置
JPH0521442A (ja) 半導体装置
JPS63175463A (ja) バイｍｏｓ集積回路の製造方法
JP2565159B2 (ja) 半導体装置及びその製造方法
JP2604793B2 (ja) 半導体装置
JP3150420B2 (ja) バイポーラ集積回路とその製造方法
JPH07273340A (ja) Ｓｏｉ型トランジスタ
JPH11233616A (ja) 半導体装置及びその製造方法
JPS58212159A (ja) 半導体集積回路装置の製造方法
JPH0436578B2 (en])
JPH0254533A (ja) 半導体装置およびその製造方法
JP3334392B2 (ja) 静電誘導形半導体装置およびその製造方法
JPH0621077A (ja) 半導体装置およびその製造方法
JPH07120704B2 (ja) 半導体装置の製造方法
JPH0697275A (ja) 半導体装置
JPS58182260A (ja) 半導体集積回路装置
JPH0574791A (ja) 半導体装置
JPH0291949A (ja) トランジスタ
JPH11330083A (ja) ラテラルバイポーラトランジスタ